Supply forms
Available configurations
- Dense sputtering target
- Bonded target assembly
- Evaporation pellets
- Granules or pieces
Request a Quote Targets & Evaporation
Hafnium Dioxide Deposition Material
HfO₂High-purity hafnium dioxide supplied as ceramic sputtering targets or evaporation source material.
RFQ specification
Information to provide
- Deposition method
- Purity
- Target dimensions or source form
- Density
- Bonding requirement
- Quantity
Applications
Typical use areas
- High-k dielectric films
- Semiconductor research
- Optical coatings
- Barrier layers
- Gate-stack development
Technical definition
Parameters used to define this product.
These are specification fields, not fixed stock values. The offered values are confirmed against your RFQ.
FormulaHfO₂
Product classesCeramic sputtering target or evaporation source material
Critical controlsPurity, source form, target density and geometry
Method definitionSputtering, thermal or e-beam route must be identified
Order definition
What is confirmed with your quotation.
Material specification
Purity, composition, grade, dimensions, tolerances and requested form.
Production configuration
Bonding, backing, surface finish, packaging or other product-specific options.
Documentation
Analysis documentation and any additional agreed dimensional or assembly records.
Commercial supply
Quantity, lead time, DAP or EXW delivery and the applicable quotation validity.
Values and forms shown are representative. Adesis confirms the commercially offered specification in the quotation and order documents.
Technical inquiry
Specify your hafnium dioxide deposition material requirement.
Send the material, purity, dimensions, quantity and application. We will review the complete specification before quoting.