Cobalt Iron Boron
Magnetic alloy target
Composition by specification
Request a Quote Multi-element target materials
Alloy & Magnetic Sputtering Targets
Custom alloy and magnetic sputtering targets for functional, data-storage and advanced thin-film applications.
Category overview
A defined product group.
An open specification range.
Alloy targets are evaluated around composition tolerance, homogeneity, manufacturing route and magnetic behavior. Customer-defined atomic or weight ratios can be reviewed.
Representative materials
Frequently requested products.
Availability, final purity, dimensions and documentation are confirmed with each quotation.
Iron Nickel
Magnetic alloy target
Multiple ratiosNickel Chromium
Resistive alloy target
Custom sizeTitanium Aluminium
Alloy target
Composition reviewCopper Gallium
Alloy target
Photovoltaic applicationsCustom Alloy
Planar target
Feasibility and homogeneity reviewSupply forms
Available configurations
- Circular and rectangular targets
- Cast or powder-metallurgy routes
- Bonded assemblies
- Custom atomic ratios
- Research quantities
Applications
Typical use areas
- Magnetic films
- MRAM and spintronics
- Resistive layers
- Hard coatings
- Photovoltaics
- Materials research
For a precise RFQ
Information to include
- Full composition and tolerance
- Atomic % or weight % basis
- Purity requirement
- Target dimensions
- Magnetic-field or cathode constraints
- Quantity
Technical inquiry
Send your alloy & magnetic sputtering targets requirement.
Send the material, purity, dimensions, quantity and application. We will review the complete specification before quoting.